JPS6131331Y2 - - Google Patents
Info
- Publication number
- JPS6131331Y2 JPS6131331Y2 JP1979139676U JP13967679U JPS6131331Y2 JP S6131331 Y2 JPS6131331 Y2 JP S6131331Y2 JP 1979139676 U JP1979139676 U JP 1979139676U JP 13967679 U JP13967679 U JP 13967679U JP S6131331 Y2 JPS6131331 Y2 JP S6131331Y2
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- reticle
- present
- pattern
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 5
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 5
- 239000011343 solid material Substances 0.000 claims 1
- 239000000428 dust Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 230000007547 defect Effects 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229920001651 Cyanoacrylate Polymers 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- MWCLLHOVUTZFKS-UHFFFAOYSA-N Methyl cyanoacrylate Chemical compound COC(=O)C(=C)C#N MWCLLHOVUTZFKS-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical group C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000010813 municipal solid waste Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1979139676U JPS6131331Y2 (en]) | 1979-10-09 | 1979-10-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1979139676U JPS6131331Y2 (en]) | 1979-10-09 | 1979-10-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5658856U JPS5658856U (en]) | 1981-05-20 |
| JPS6131331Y2 true JPS6131331Y2 (en]) | 1986-09-11 |
Family
ID=29371016
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1979139676U Expired JPS6131331Y2 (en]) | 1979-10-09 | 1979-10-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6131331Y2 (en]) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0262A (ja) * | 1989-04-07 | 1990-01-05 | Daicel Chem Ind Ltd | フォトマスクカバー |
| JP5189614B2 (ja) * | 2010-03-29 | 2013-04-24 | 信越化学工業株式会社 | ペリクル及びその取り付け方法、並びにペリクル付マスク及びマスク |
-
1979
- 1979-10-09 JP JP1979139676U patent/JPS6131331Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5658856U (en]) | 1981-05-20 |
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